| 释义 |
HFCVD
基本例句
热丝化学气相沉积¹⁰⁰
Polycrystalline silicon thin films were prepared by hot-filament chemical vapor deposition on glass at low-temperatures.采用热丝化学气相沉积法在普通玻璃衬底上低温沉积多晶硅薄膜。
According to the boundary condition of practical working state,the distribution of the thermal stress inHFCVDdiamond film is calculated by ANSYS and verified by experiments.本文根据HFCVD金刚石膜沉积过程中实际工作状态的边界条件,通过有限元软件ANSYS计算分析HFCVD金刚石膜中的热应力分布,并通过实验进行了验证,获得了HFCVD膜中热应力的分布规律以及金刚石膜半径、厚度、沉积温度和冷却速度四项实验条件对热应力的影响。
In this work,-textured CVD diamond film with better quality was obtained by using a hot filament chemical vapor deposition technique to fabricate as X-ray detectors.采用HFCVD方法制备了高质量、取向的CVD金刚石膜,在此基础上研制出X射线探测器。
To improve the quality of Ta Spinnerets with high hardness and alkali-proof corrosion,HFCVDis used to deposit crystalline diamond films with different sizes of grain on carbonized Ta spinnerets.为改善钽喷丝头的品质,提高其硬度和耐碱腐蚀能力,利用热丝CVD制备不同粒径的金刚石薄膜,并通过对钽衬底的碳化处理,成功使之沉积于纯钽喷丝头表面,对纯钽喷丝头进行表面强化。 |