| 释义 |
ulsi 英ʌl'sɪ美ʌl'sɪ BNC²³⁶²¹³⁺¹
基本例句
超大规模集成,超大规模集成化
The interlayer dielectric materials with ultra low dielectric constant are researched to adapt to the development of the high speed and high density for ultra large scale integrated circuit ULSI.
为了适应 ULSI高速、高集成度发展，人们开始探索具有超低介电常数的电互联介质材料。 cnki
The copper chemical mechanical polishing CMP which is the key planarization technology for ULSI manufacturing was discussed, and the progress and problems of CMP were reviewed in the paper.
对 ULSI制备中铜布线化学机械抛光 CMP进行了分析，综述了铜 CMP技术的研究现状。 cnki
The latest advance of the dry etching for submicron fabrication in ULSI production and interrelated technology are introduced.
综述了亚微米、深亚微米干法刻蚀和相关技术的最新进展及其在超大规模集成电路制造中的应用。 cnki
The selectivity, the chemical and mechanical function's matching, the storage of the slurry and post CMP cleaning ULSI inlaid tungsten CMP have been studied in this article.
研究的是 ULSI镶嵌钨 CMP的选择性，化学与机械作用匹配，浆料的悬浮及存放和后清洗等问题。 cnki
As a unique global planarization method, chemical mechanical polishing CMP, which has been developed at a fast pace, finds wide applications in ULSI's in recent years.
作为唯一能实现全局平坦化方法的化学机械抛光 CMP，近年来发展迅速，应用广泛。 cnki
Dishing problem of copper multilayer interconnection in ULSI was introduced, and the reasons and influencing factors were analyzed.
介绍了 ULSI多层铜互连线中的碟形坑问题，对其产生的原因及影响因素进行了分析。 cnki
Nowadays, CMP technology has been widely used in ULSI manufacturing.
目前， CMP技术已成为 ULSI时代最广泛使用的平坦化技术。 cnki
Shift from Al to Cu interconnects in Ultra-Large Scale Integrate ULSI is important for semiconductor industry.
利用铜代替铝作为超大规模集成电路的互连接线，代表了半导体工业的重要转变。 cnki
The quality requirements on Si wafer for modern ULSI, research progress on CZ Si crystal growth technology and wafer processing, the market situation and prospect were outlined.
概述了现代特大规模集成电路对硅单晶片的质量要求、直拉硅单晶生长工艺及晶片加工技术研究进展和硅单晶材料市场现状及发展趋势。 cnki
This paper describes the development of phase shifting lithography and its applications in ULSI technology.
本文综述了相移光刻技术的发展及其在 ULSI中的应用。 cnki
To satisfy the water quality demand for ultra-large scale integrated circuits ULSI manufacture in1990s, new technologies of pure water preparation are being developed worldwide.
为适应九十年代甚大规模 ULSI集成电路水质要求，各国均在探讨纯水制造的新工艺模式。 http://dict.cnki.net
Various CVD technologies for preparing low dielectric constant materials in ULSI circuits are summarized.
综述了制备 ULSI低介电常数材料的各种 CVD技术。 cnki
We present major milestones in the development of MOSFET from inception to ULSI, and discuss future trends of MOSFET performance.
现在，我们评述从 MOSFET的起始，直到在 ULSI中应用时期的主要里程碑，并且讨论 MOSFET功能的未来趋势。 cnki |