| 释义 |
RF sputtering
基本例句
射频溅射
In this study, theRF sputteringsystem has been investigated comprehensively.中文摘要本篇论文主要是探讨RF溅镀系统之研究。
Ba0.65Sr0.35TiO3thin films were deposited on Pt/Ti/SiO2/Si substrates by inverted cylindricalRF sputtering.采用倒筒式射频溅射方法;在Pt/Ti/SiO2/Si基片上制备了Ba0.;65Sr0
The coefficient of friction of the sample prepared by RF sputter had inversely-proportional relationship with S/W ratio in definitive range.通过射频溅射所获得薄膜的摩擦系数在一定范围内与其硫钨比成反比。
InRF sputteringprocesses, it was observed that total metallic silver percentage in thin films was independent of RF power when oxygen partial pressure exceeded some specific value.但是在射频溅镀制程中，氧气分压比例超过一特定值时，薄膜中银的百分比不会随镀膜功率提高而增加。
STUDY ON YELLOWISH OF FLUOROCARBON FILMS PREPARED BY RF SPUTTERING射频溅射法制备氟碳高分子膜的泛黄问题研究 |