| 释义 |
photomask 英'fəutəumɑ:sk美'fəutəumɑ:sk COCA¹⁷⁵⁵⁷²
基本例句
n.光掩模¹⁰⁰
名词100%
用作名词The present invention discloses a producing method for aphotomaskand a thin-film transistor basal plate.本发明公开了一种光掩模及薄膜晶体管基板的制造方法。
Compared with the well known manufacturing method of a pixel structure, the invention can simplify processing steps and reduces the manufacturing cost ofphotomask.本发明相比于公知的像素结构制作方法，可以简化工艺步骤并减少光掩模的制作成本。 |