| 释义 |
E-beamCOCA¹⁰³⁴⁰³
基本例句
n.电子束
The proximity effect in the E-beam lithography system was verified by experiments.
利用电子束曝光机完成有关邻近效应的实验。 cnki
The proximity effect in the SDS-3 E-beam lithography system is verified by experiments.
利用 SDS-3电子束曝光机完成有关邻近效应的试验。 cnki
E-beam tools are used in photomask writing, but many believe the technology will never be fast enough for high-volume semiconductor lithography.
因此目前电子束光刻设备主要的用途是用于刻制掩膜板，许多人甚至认为电子束光刻技术的产出量永远也无法满足芯片量产的需求。 cnbeta.com
As the next generation E-beam projection lithography technology, PREVAIL carries out the projection reduction exposure to the SiC membrane supported by silicon mount with variable immersion lenses.
PREVAIL作为下一代电子束投影曝光技术，采用可变轴浸没透镜，对以硅为支架的碳化硅薄膜进行投影微缩曝光。 cnki
Energy deposition of e-beam in laser medium is measured by fast response pressure transducer.
用快响应压力传感器测量了激光腔中能量沉积，实验气体为氩、氪及氟化氪激光介质。 cnki
The long pulse electron beam system reported here was constructed for transverse pumping and e-beam sustained discharge large energy gas laser.
本文介绍的长脉冲大面积强流电子束系统是为横向泵浦和控制放电泵浦大能量气体激光而设计和研制的。 cnki |